Fig. 3From: An exclusion mechanism is epistatic to an internal detoxification mechanism in aluminum resistance in ArabidopsisRelative root growth (RRG%) of WT and almt1, mate and almt1_mate mutants (a) and WT and almt1_mate, almt1_nip1;2 double mutants (b). Seeds were germinated and grown in hydroponic solution (pH 4.3) supplemented with 0, 5, 10, 20, 30, 40, 50 μM of AlCl3 for 5 days. Data are means ± s.d. (n = 10)Back to article page