Fig. 2From: An exclusion mechanism is epistatic to an internal detoxification mechanism in aluminum resistance in ArabidopsisRelative root growth of WT and almt1, nip1;2 and almt1_nip1;2 mutants. Seeds were germinated and grown in hydroponic solution (pH 4.3) supplemented with 0, 5, 10, 20, 30, 40, 50 μM of AlCl3 for 5 days. Root length (mm) of individual seedlings was measured. Relative root growth (RRG%) was calculated according to the following formula: RRG% = root growth of individual plants under Al treatment/mean root growth under the control (−Al) condition. Data are means ± s.d. (n = 10)Back to article page