Fig. 5From: An exclusion mechanism is epistatic to an internal detoxification mechanism in aluminum resistance in ArabidopsisAluminum content in the root cell wall (a) and the root cell sap (b). Seven-day-old seedlings of WT, almt1, nip1;2 and almt1_nip1;2 were exposed to 50 μM AlCl3 (pH 4.3) for 2 days. Al concentrations in the root cell wall (a) and the root cell sap (b) were determined by ICP-MS. Data are mean ± s.d. of three biological replicates from three Magenta boxes. Letters represent groups with significant differences (P ≤ 0.05)Back to article page